Purge ring for a substrate processing chamber

[0001]FIG. 1 is a top isometric view of a purge ring for a substrate processing chamber, showing our new design;

[0002]FIG. 2 is a top plan view thereof;

[0003]FIG. 3 is a bottom plan view thereof;

[0004]FIG. 4 is a front elevation view thereof;

[0005]FIG. 5 is a back elevation view thereof;

[0006]FIG. 6 is a right elevation view thereof;

[0007]FIG. 7 is a left elevation view thereof; and,

[0008]FIG. 8 is an enlarged cross-sectional view taken along line FIG. 8-FIG. 8 and encircled portion labeled, “8,” in FIG. 2.

[0009]The dot-dashed broken lines of the two boxes shown in FIGS. 2 and 8 illustrate the boundary lines of the enlarged portion view of FIG. 8 and form no part of the claimed design. The dot-dashed arrows labeled, “FIG. 8,” indicate the cut line of the cross-sectional view of FIG. 8 in FIG. 2 and form no part of the claimed design. The even dashed broken lines of S-shaped curves shown in the drawing of FIG. 8 define a break in length between the enlarged sections and form no part of the claimed design. The even dashed broken lines of the circles in FIGS. 1-3 form no part of the claimed design.