Company patents
Cymer, LLC
Cymer, LLC's patent strategy is heavily concentrated in core semiconductor technologies, with Photolithography (76.3% of portfolio) and Lasers (71.1% of portfolio) showing strong growth in 2025 at +35.0% and +20.0% YoY respectively, before a significant decline so far in 2026. Surprisingly, despite its focus, the company has seen a complete cessation of patenting in Semiconductor Manufacturing Process so far in 2026, after a 100.0% growth in 2025.
Patent Trend by Technology Area
Yearly patent publications since 2023
Product themes
Product-level themes inferred from filings since 2023, with category chips showing where each theme appears. Select a theme to filter the patents below.
97 US filings (since 2023) · 11 categories · 15 themes
Techniques and apparatus for measuring critical dimensions, overlay accuracy, defect detection, and surface topography in lithographic processes, often involving optical, laser, or charged particle beams.
Components, processes, and methods specifically designed for Extreme Ultraviolet (EUV) lithography, including light sources, reflective optics, masks, pellicles, and contamination control mechanisms.
Methods and equipment for applying photoresist uniformly onto wafers, forming patterns through various exposure techniques (e.g., direct imaging, multi-exposure), and integrating patterned layers into semiconductor structures or packaging.
Techniques and systems for ensuring the safe and precise operation of lasers, including power regulation, hazard detection, and deconfliction mechanisms in complex or dynamic environments.
Techniques for precise material removal, pattern shaping, and controlling etch selectivity or uniformity, often involving plasma, wet chemistry, or directed beams to achieve desired features on semiconductor substrates.
Techniques for manufacturing semiconductor laser chips, including active region design, mirror structures, current and optical confinement, and the integration of multiple layers or elements on a substrate.
Innovations in the design, materials, and manufacturing of lithography masks, including reflective masks, programmable masks, and defect mitigation strategies, to enable finer feature patterning and process control.
Methods and structures for assembling laser chips into functional modules, encompassing optical alignment, electrical interconnection, mechanical support, thermal management, and encapsulation for protection.
Mechanisms and designs for actively changing or stabilizing the output wavelength, frequency, or spectral properties of a laser, often involving integrated optical filters, resonators, or pump adjustments.
Systems and components related to fiber lasers and fiber optical amplifiers, including doped fibers, pump schemes, and specialized fiber structures for gain, filtering, or thermal management.
Development of sophisticated optical lens assemblies and computational methods to achieve high-resolution, precise, or specialized imaging, often for medical or scientific applications.
Design and integration of lasers and associated components specifically for transmitting data over optical fibers or through free space, including modulation schemes and efficient light coupling.
Technologies and systems for removing unwanted components or separating desired gases from a mixed gas stream, including adsorption, absorption, and membrane-based methods.
Methods and compositions for applying metallic or alloy layers to a substrate, or modifying the surface of an alloy, to impart specific functional properties such as corrosion resistance, wear resistance, electrical insulation, or improved adhesion, without altering the bulk properties significantly.
Systems and devices that utilize controlled magnetic fields, often generated by electromagnets, to produce mechanical motion, precise positioning, or manipulate physical phenomena like plasma distribution.
Patents
Showing 1-10 of 39
Substrate Patterning & Processing