Company patents
DUPONT SPECIALTY MATERIALS KOREA LTD.
DUPONT SPECIALTY MATERIALS KOREA LTD's patent strategy reveals a surprising and significant emerging focus on pharma_biotech, with Heterocyclic Compounds (Pharma) experiencing a massive 1550.0% YoY growth in 2025, contributing 45.2% of its portfolio, alongside a 100.0% YoY growth in General Organic Chemistry Methods so far in 2026, indicating a strategic pivot beyond its dominant Organic Electronics (OLED) and Functional Materials (LCD, Lubricants) categories, which saw substantial growth in 2025 but show declines so far in 2026.
Patent Trend by Technology Area
Yearly patent publications since 2023
Product themes
Product-level themes inferred from filings since 2023, with category chips showing where each theme appears. Select a theme to filter the patents below.
104 US filings (since 2023) · 10 categories · 8 themes
Development and optimization of organic chemical compounds and their structures, including guest-host systems and metal complexes, used within the emission layer to achieve specific light emission characteristics such as color, efficiency, and operational lifetime.
Synthesis and application of organic compounds designed to impart specific functionalities in material science, such as photosensitivity or charge transport, for electronic or optical devices.
Techniques and structural designs for fabricating the physical layers of an OLED display, including material deposition, patterning, and methods to protect the active organic layers from environmental degradation like moisture and oxygen.
Components and techniques aimed at improving the visual quality of OLED displays, such as color accuracy, contrast, brightness uniformity, and reducing reflections or glare through optical layers and coatings.
Synthesis and modification of polysiloxane polymers to introduce specific functional groups or structures, enhancing properties for applications like composites, coatings, biomedical uses, or powder treatment.
Development of novel chemical compositions for photoresists, including polymers, sensitizers, and crosslinking agents, to achieve improved lithographic performance such as resolution, sensitivity, line edge roughness, and etch resistance.
Methods and equipment for applying photoresist uniformly onto wafers, forming patterns through various exposure techniques (e.g., direct imaging, multi-exposure), and integrating patterned layers into semiconductor structures or packaging.
Additives or compositions specifically formulated for surface application or modification to impart protective, decorative, or specialized functional properties to polymer products.
Patents
Showing 1-10 of 104