FORMLABS, INC.

Techniques are described for generating a support structure that connects to a part while avoiding connecting to regions that include one or more less desirable features, such as at edges, corners and/or high detail regions. A computing device may be configured to identify regions of the surface of a part that contain less desirable surface features, and exclude and/or disfavor those regions for connection to a support structure when generating the support structure. In some embodiments, regions containing less desirable surface features can be defined by a user, such as via a graphical user interface displaying a three-dimensional (3D) representation of a part to be fabricated.

Techniques are described to gather information from an end user relating to fabrication process failures in a standardized manner. This information may be provided to an additive fabrication device manufacturer and analyzed by the manufacturer. Analysis may include identifying patterns in the data to identity problems relating to an additive fabrication device, software used to operate the device and/or user operations. Identification of such patterns may aid in selecting and/or generating support solutions to be provided the end user, or to improve the additive fabrication device and/or software.

Techniques are described to gather information from an end user relating to fabrication process failures in a standardized manner. This information may be provided to an additive fabrication device manufacturer and analyzed by the manufacturer. Analysis may include identifying patterns in the data to identity problems relating to an additive fabrication device, software used to operate the device and/or user operations. Identification of such patterns may aid in selecting and/or generating support solutions to be provided the end user, or to improve the additive fabrication device and/or software.

A curing system includes a basin configured to receive a photopolymer resin, an ultraviolet light source, and a translating device. The ultraviolet light source is configured to selectively emit ultraviolet light. The ultraviolet light defines a pixelated array that illuminates at least a portion of the photopolymer resin. The pixelated array includes a first array axis and a second array axis oriented perpendicular to the first array axis. The translating device is configured to translate the pixelated array along a translation axis at an oblique angle relative to the first array axis.

According to some aspects, techniques are provided for identifying contamination in additive fabrication devices by measuring light interacting with the contamination using one or more light sensors. Contamination located between a light source and a target of a light source can affect the uniformity and intensity of the light source when incident upon the target. For instance, in an inverse stereolithography device, contamination located between a light source and a liquid photopolymer resin that is to be cured can affect the quality of the fabricated object when the light is scattered or blocked by the contamination. Identifying the presence of contamination between the light source and the liquid photopolymer resin and alerting the user prior to initiating a fabrication process may increase the quality of the resulting fabricated object and improve the user experience by saving time and photocurable liquid.

Techniques are described for calibrating an optical system in an additive fabrication device using an image of the build surface within the device. These techniques allow calibration to be performed by imaging one or more calibration features generated on (or at) the build surface, which may include illuminated regions of the build surface, regions of the build surface on which solid material has been formed, and/or regions of the build surface to which energy has otherwise been directed thereby making those regions distinguishable from their surroundings. The calibration features may be produced (at least in part) by the optical system to be calibrated. The location of the calibration features within the image may be compared with the intended location of these calibration features, and corrections to the optical system determined based on any differences between the actual and intended locations.

Techniques are described to gather information from an end user relating to fabrication process failures in a standardized manner. This information may be provided to an additive fabrication device manufacturer and analyzed by the manufacturer. Analysis may include identifying patterns in the data to identity problems relating to an additive fabrication device, software used to operate the device and/or user operations. Identification of such patterns may aid in selecting and/or generating support solutions to be provided the end user, or to improve the additive fabrication device and/or software.

Techniques are described for calibrating an optical system in an additive fabrication device using an image of the build surface within the device. These techniques allow calibration to be performed by imaging one or more calibration features generated on (or at) the build surface, which may include illuminated regions of the build surface, regions of the build surface on which solid material has been formed, and/or regions of the build surface to which energy has otherwise been directed thereby making those regions distinguishable from their surroundings. The calibration features may be produced (at least in part) by the optical system to be calibrated. The location of the calibration features within the image may be compared with the intended location of these calibration features, and corrections to the optical system determined based on any differences between the actual and intended locations.

According to some aspects, techniques are provided for identifying contamination in additive fabrication devices by measuring light interacting with the contamination using one or more light sensors. Contamination located between a light source and a target of a light source can affect the uniformity and intensity of the light source when incident upon the target. For instance, in an inverse stereolithography device, contamination located between a light source and a liquid photopolymer resin that is to be cured can affect the quality of the fabricated object when the light is scattered or blocked by the contamination. Identifying the presence of contamination between the light source and the liquid photopolymer resin and alerting the user prior to initiating a fabrication process may increase the quality of the resulting fabricated object and improve the user experience by saving time and photocurable liquid.

A method for producing a three-dimensional (3D) object on an additive fabrication device includes receiving, by a computer, print instructions for the 3D object. The print instructions include a sequence of print maps, each print map corresponding to a sub-instruction for producing a respective cross-section of the 3D object. The method also includes exposing, by an energy source, resin stored in a resin container at a print plane according to a first print map of the sequence of print maps, and modifying a second print map of the sequence of print maps. The method further includes exposing, by the energy source, resin stored in the resin container at the print plane according to the modified second print map.