JEOL Ltd.

Provided is a charged particle beam source having an emitter that can be replaced easily. The charged particle beam source includes an electron gun chamber; a first unit including both a supportive insulative member mechanically supporting a cable and a first set of terminals electrically connected to the cable; and a second unit including both the emitter that releases charged particles and a second set of terminals electrically connected to the emitter. The chamber has a side wall provided with a through-hole in which the first unit is secured. The second unit can be detachably mounted to the first unit. Within the chamber, the emitter is placed on an optical axis, so that the first and second sets of terminals are brought into contact with each other.

A second polymer is prepared through derivatization of a first polymer. Kendrick Mass Defect (KMD) analysis is applied on a mass spectrum of the second polymer, to thereby produce a plot. Meanwhile, a plurality of mass candidates for a non-primary-chain segment are calculated based on a mass spectrum of the first polymer. The KMD analysis is applied on the plurality of mass candidates, to thereby produce reference images. A mass of the non-primary-chain segment is identified through matching of two KMD analysis results.

A method of generating reports starts with comparing an event log with a plurality of event patterns. It is found that there is a match between a certain series of events and a certain event pattern. A data set acquired by execution of the certain series of events is incorporated into a template corresponding to the certain event pattern. Consequently, a candidate report is generated. The automatically generated candidate report is deleted as needed according to a user's instruction.

An electron microscope includes an electron source that emits an electron beam; an electrostatic/electromagnetic field superposed objective lens in which an acceleration tube is built into a magnetic field lens; a correction electrode placed between the acceleration tube and a specimen; and a specimen stage that tiltably supports the specimen. A positive voltage is applied to the acceleration tube, a negative voltage is applied to the correction electrode, and a potential on an optical axis between the correction electrode and the specimen is equal to or higher than a potential of the specimen.

A sample tube lock is disposed at a given position on the outer periphery of the sample tube. A holder has a central portion provided with a vertically extending insertion space into which the sample tube is inserted. The holder supports the sample tube lock. A rotor surrounds the sample tube lock and the sample tube and includes a groove formed in the vicinity of the inner surface of the holder. A holder lock includes a cylindrical sidewall, a top wall and a flange portion. The top wall extends inwardly from the top end of the cylindrical sidewall and has an insertion hole into which the sample tube is inserted. The flange portion extends outwardly from the outer periphery at the lower end of the sidewall. The outer peripheral portion of the flange portion is received in the groove and secured to the rotor.

An electron microscope includes an electron optical system, and a control unit that controls the electron optical system. The control unit performs processing for determining a standard deviation of a brightness distribution of an electron microscope image; processing for determining an optimum value of a parameter of the electron optical system such that the standard deviation becomes the maximum, by Gaussian process regression; and processing for capturing the electron microscope image with setting a value of the parameter to the optimum value. The control unit repeats the processing for determining the standard deviation, the processing for determining the optimum value, and the processing for capturing the electron microscope image to determine a value of the parameter.

A method of adjusting a charged particle optical system in a charged particle beam apparatus provided with the charged particle optical system including an aberration corrector in which multipole elements disposed in three or more stages and transfer optical systems are alternately disposed. The method includes adjusting aberration using at least two of the multipole elements without using at least one of the multipole elements, and adjusting parameters of the charged particle optical system other than aberration using at least one of the transfer optical systems that is not disposed between the at least two of the multipole elements used.

A plurality of records are registered in a database. Each record includes emission information and a peak energy sequence. A fitting unit fits, for each peak energy sequence, a calculated spectrum which is based on the peak energy sequence with respect to an actual spectrum which is acquired from a sample. An analyzer analyzes the sample based on the emission information correlated to the calculated spectrum satisfying a fitting condition.

An analyzing method using an analyzer including a wavelength-dispersive X-ray spectrometer that has an analyzing element to analyze an X-ray emitted from a specimen and detects an X-ray of energy corresponding to a position of the analyzing element. The analyzing method includes acquiring a plurality of map data by repeatedly performing a mapping analysis while changing the position of the analyzing element, the mapping analysis being an analysis to detect an X-ray of specific energy with the position of the analyzing element fixed to acquire map data while scanning the specimen with an electron beam; and generating, based on the plurality of map data, a spectrum map in which a position on the specimen and an X-ray spectrum are associated with each other.