Company patents
JUSUNG ENGINEERING CO., LTD.
JUSUNG ENGINEERING CO., LTD's patent strategy reveals a strong, sustained focus on "Coating & Surface Treatment," which comprises 47.0% of its portfolio, despite a -31.2% decline in patenting activity so far in 2026. Surprisingly, while "Semiconductor Manufacturing Process" saw a significant 55.6% YoY growth in 2024, its patenting in this area has sharply declined by -53.8% so far in 2026, indicating a potential shift in priorities, even as "Semiconductor Diodes & Transistors" shows emerging growth with a 33.3% YoY increase in 2026.
Patent Trend by Technology Area
Yearly patent publications since 2023
Product themes
Product-level themes inferred from filings since 2023, with category chips showing where each theme appears. Select a theme to filter the patents below.
117 US filings (since 2023) · 12 categories · 21 themes
Techniques and methodologies for fabricating semiconductor devices, including etching, deposition, annealing, isolation, and doping steps, aimed at improving yield, performance, or enabling new structures.
Design and control of plasma processing chambers, including heating, gas delivery, electrode configurations, and magnetic field control for uniform and efficient material processing in semiconductor manufacturing.
Systems and methods for automated substrate transport, precise positioning, temperature regulation, and chamber environment management to ensure process stability, uniformity, and yield in semiconductor manufacturing.
Techniques for precise material removal, pattern shaping, and controlling etch selectivity or uniformity, often involving plasma, wet chemistry, or directed beams to achieve desired features on semiconductor substrates.
Methods for depositing thin films with controlled conformality, thickness, and material properties, including selective deposition on specific areas, often using atomic layer deposition (ALD), chemical vapor deposition (CVD), or epitaxial growth.
Specialized cleaning techniques and apparatus designed for removing microscopic contaminants, residues, or films from sensitive substrates, such as semiconductor wafers or flat panel displays, often involving chemical, mechanical, or plasma-based methods.
Design and engineering of specialized components within deposition systems, such as heaters, targets, susceptors, and chamber walls, to achieve precise control over process parameters like temperature, material flux, and plasma characteristics.
Techniques and structural designs for fabricating the physical layers of an OLED display, including material deposition, patterning, and methods to protect the active organic layers from environmental degradation like moisture and oxygen.
Focuses on novel semiconductor materials, heterostructures, and doping profiles to improve photovoltaic conversion efficiency, stability, and spectral response.
Novel materials and processes for forming low-resistance electrical contacts and interconnects within semiconductor devices, including selective deposition, silicidation, and barrier layers for improved performance and scaling.
Systems that incorporate solar panels as a primary or auxiliary power source for various applications, including visual displays, remote devices, and portable battery charging, often emphasizing efficiency and adaptability.
Methods and systems for real-time monitoring and control of coating processes or chamber cleaning, utilizing sensor data (e.g., thermal, pressure, optical) and predictive models to ensure quality and optimize efficiency.
Systems and processes for applying coatings, films, or materials onto surfaces in manufacturing or industrial contexts, often involving automated movement, surface preparation, or post-application treatment.
Techniques and apparatus for electrically testing semiconductor devices, integrated circuits, or wafers during manufacturing or post-assembly, including built-in self-test (BIST) and contact reliability assessment.
Advanced techniques for forming and optimizing gate dielectrics, work function layers, and other dielectric layers within transistor structures to improve performance, reliability, and scaling.
Systems and methods for accurately controlling the volume, location, and characteristics of sprayed fluids, often involving sensors, feedback, or specific nozzle geometries for precise application.
Systems and methods for delivering radio frequency (RF) power to plasma processing chambers, including impedance matching, pulse shaping, and feedback control for stable and efficient plasma generation.
Focuses on the design and manufacturing of transistors where the gate material fully encircles the channel, often using nanosheets or fins, to improve electrostatic control and reduce short-channel effects.
Materials and processes for hermetic encapsulation, conformal coating, optical chip sealing, and stretchable conductors for electronic and optoelectronic devices.
Techniques and apparatus for achieving and maintaining vacuum conditions within charged particle and plasma processing chambers, including pump control, vacuum degree monitoring, and chamber sealing.
Systems specifically engineered to use sprayed liquids or aerosols for cleaning surfaces, removing residues, or distributing disinfectants in various environments.
Patents
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Electronics Encapsulation & Sealing