LASERTEC CORPORATION

An information processing apparatus includes a learning unit configured to train a model, a captured image acquisition unit configured to acquire a captured image, a reference image generation unit configured to generate a reference image, and an evaluation unit configured to evaluate an object based on a comparison between the reference image and the captured image, in which the learning unit includes a structural representation data acquisition unit configured to acquire a plurality of pieces of structural representation data, a classification unit configured to classify the plurality of pieces of structural representation data into one of a plurality of classes, a representative position acquisition unit configured to select representative data to be representative from among the pieces of structural representation data belonging to the same class and acquire a representative position corresponding to the class, and a training unit configured to train the model.

Provided are an illumination apparatus and an illumination method capable of uniformly illuminating a visual field region detected by a detector. The present disclosure provides an illumination apparatus including: a drive unit configured to drive an optical member such that illumination light scans, in one direction, a visual field region that is a region extending in the one direction on a sample; and a control unit configured to control the drive unit to cause the illumination light to scan in synchronization with a transfer of a sensor that receives light from the visual field region illuminated by the illumination light.

An image processing device according to the present embodiment includes: a setting unit configured to set a first parameter for a first pattern extending in a first direction on a reference image plane, based on a first sample image area that is an area including the first pattern, and set a second parameter for a second pattern extending in a second direction orthogonal to the first direction, based on a second sample image area that is an area including the second pattern; an obtaining unit configured to obtain a specimen image that is a captured image taken through a predetermined image capturing optical system by capturing an image of a specimen that has a third pattern extending in the first direction and a fourth pattern extending in the second direction; and a processing unit configured to perform predetermined information processing for the specimen image.

A calculation method, an image-capturing method, and an image-capturing apparatus are provided which can easily calculate a shear amount produced by an optical element arranged on an optical path of an interference optical system. A calculation method according to the present disclosure is a calculation method of calculating a shear amount produced by a predetermined optical element which is arranged on an optical path of an image-capturing optical system. The calculation method includes a step of capturing an interference contrast image of a quadric surface included in an object surface by the image-capturing optical system, a step of measuring a fringe interval of interference fringes included in the interference contrast image, and a step of calculating the shear amount based on a constant in a formula expressing the quadric surface and the fringe interval.

The information processing apparatus according to the present embodiment includes: a learning unit configured to train a model; a captured image acquisition unit configured to acquire a captured image; a reference image generation unit configured to generate a reference image; and an evaluation unit configured to evaluate the object based on a comparison between the reference image and the captured image, the learning unit includes a residual calculation unit configured to calculate a residual by comparing a generated image output from the model in a training course with a training image including the captured image, and a determination unit configured to determine that training of the model is completed when the residual satisfies a predetermined condition, and the residual calculation unit calculates a residual based on the differential image.

An image processing method includes: a process of acquiring an inspection image, which is an image obtained by imaging an inspection target area of an object to be inspected, the inspection image being included in an image obtained by imaging, by a detector having a predetermined imaging range, the object to be inspected; a process of acquiring positional data indicating an imaging position, which is a position of the inspection image, in the predetermined imaging range; a process of generating a reference image based on design information of the object to be inspected; and a process of inspecting the inspection target area by comparing the inspection image with the reference image, in which in the process of generating the reference image, different reference images are generated, by using the positional data, for areas that show a common structure in the design information.

An image processing method includes: a process of acquiring an inspection image, which is an image captured by illuminating, by critical illumination, an inspection target area of an object to be inspected; a process of acquiring illumination profile information indicating an illumination profile at the time of image capturing; a process of generating a reference image based on design information of the object to be inspected; and a process of inspecting the inspection target area by comparing the inspection image with the reference image, in which, in the process of generating the reference image, by using the illumination profile information, different reference images are generated for areas that show a common structure in the design information.

To provide a control apparatus and a control method that enable inspection accuracy of a mask with a pellicle to be improved. A control apparatus of an optical apparatus equipped with light detecting means for detecting light from a pattern surface of a photomask illuminated by illumination light, the control apparatus including: acquiring means for acquiring pellicle information indicating whether or not a pellicle is mounted on a photomask; and setting means for setting a charge accumulation time in the light detecting means when illuminating a pattern surface of the photomask on which the pellicle is mounted by the optical apparatus to be longer than a charge accumulation time in the light detecting means when illuminating a pattern surface of the photomask on which the pellicle is not mounted by the optical apparatus.

A defect classification method includes: projecting an illumination beam toward the silicon carbide substrate and scanning a position at which the silicon carbide substrate is illuminated with the illumination beam; detecting reflected light and photoluminescence light including light in a visible region, emitted from the silicon carbide substrate; and classifying the defects based on a result of the detection of the reflected light and a result of the detection of the photoluminescence light including the light in the visible region, in which the classifying the defects includes classifying the defect as a 3C-SF (Stacking Fault) based on detection of a first defect image by the reflected light and classifying the defect as an SSF (Shockley-type Stacking Fault) based on detection of a second defect image by the photoluminescence light including the light in the visible region.

A defect inspection apparatus according to the present embodiment includes: an irradiation optical system configured to irradiate a sample including a SiC substrate, a buffer layer formed on the SiC substrate, and a drift layer formed on the buffer layer with excitation light; a filter unit configured to control a wavelength band to transmit photoluminescence light generated from the sample; a detection optical system configured to detect the photoluminescence light transmitted through the filter unit; and an image processing unit configured to form an image from the detected photoluminescence light and to discriminate a defect captured in the formed image, and the image processing unit discriminates the defect based on whether a length of the defect is L 1 =(D 1 +D 2 )/tan θ or L 2 =D 2 /tan θ.