Company patents
MKS Instruments, Inc.
MKS Instruments, Inc. surprisingly shows a significant shift in its patent strategy, with its dominant "Electron / Ion Tubes & Discharge" category, representing 51.0% of its portfolio, experiencing a sharp 55.0% decline in patenting in 2025. While "Force / Pressure Measurement" saw a 75.0% increase in 2024, it then plummeted by 85.7% in 2025, indicating a highly volatile and potentially reactive approach to innovation rather than sustained focus in these areas.
Patent Trend by Technology Area
Yearly patent publications since 2023
Product themes
Product-level themes inferred from filings since 2023, with category chips showing where each theme appears. Select a theme to filter the patents below.
96 US filings (since 2023) · 12 categories · 19 themes
Systems and methods for delivering radio frequency (RF) power to plasma processing chambers, including impedance matching, pulse shaping, and feedback control for stable and efficient plasma generation.
Design and control of plasma processing chambers, including heating, gas delivery, electrode configurations, and magnetic field control for uniform and efficient material processing in semiconductor manufacturing.
Systems and sensors designed to measure the pressure difference between two distinct points or to capture rapid, transient pressure fluctuations in fluid or gas systems, often using diaphragms or pistons.
Innovations in the construction, integration, and operational verification of flow measurement devices, including methods for calibration, fault detection, and structural integrity monitoring.
Methods and systems for real-time monitoring and control of coating processes or chamber cleaning, utilizing sensor data (e.g., thermal, pressure, optical) and predictive models to ensure quality and optimize efficiency.
Methods and apparatus for precise wafer positioning, ion beam uniformity, and dose monitoring during ion implantation processes in semiconductor device manufacturing.
Sensors that quantify strain or deformation by measuring the change in electrical resistance of a material, such as a semiconductor film or conductive layers, as it undergoes mechanical stress.
Circuits designed to transform the impedance of a source to match the impedance of a load, maximizing power transfer or minimizing signal reflections, often involving inductors, capacitors, and transformers.
Incorporating sensors and processing capabilities directly into valve systems to monitor operational state, detect malfunctions, measure flow parameters, or verify proper installation.
Design and engineering of specialized components within deposition systems, such as heaters, targets, susceptors, and chamber walls, to achieve precise control over process parameters like temperature, material flux, and plasma characteristics.
Techniques and apparatus for achieving and maintaining vacuum conditions within charged particle and plasma processing chambers, including pump control, vacuum degree monitoring, and chamber sealing.
Technologies for measuring the flow rate, level, or composition of mixtures containing multiple fluid phases (e.g., liquid-liquid, liquid-gas, liquid-solid suspensions), often employing specialized sensing principles to differentiate components.
Specialized digital and mixed-signal circuits for controlling and reading out quantum bits (qubits), including generating precise modulated RF signals and integrating with photonic components for quantum operations.
Systems and methods for accurately controlling the volume, location, and characteristics of sprayed fluids, often involving sensors, feedback, or specific nozzle geometries for precise application.
Methods and compositions for identifying, quantifying, or characterizing specific biological molecules (e.g., nucleic acids, proteins, metabolites, antibodies) or microbial species, often for diagnostic, prognostic, or quality control applications.
Techniques and circuits designed to regulate output, manage input variations, mitigate resonance, or ensure stable operation of power converters under diverse load and source conditions. This includes adaptive, predictive, or fault-tolerant control schemes.
Mechanisms and control systems for precisely moving valve elements, often involving electric motors, cams, solenoids, or pneumatic/hydraulic pilots, to achieve desired flow or position.
Focuses on novel circuit configurations for DC-DC, DC-AC, or AC-DC conversion, often involving resonant operation, multi-level structures, or switched capacitors to improve efficiency, power density, or voltage conversion ratios.
Specialized valve designs for domestic and commercial applications involving water distribution, temperature control, and air conditioning, often focusing on integration, materials, and specific flow characteristics.
Patents
Showing 1-9 of 9
Precision Dosing & Targeted Spraying