NEXEON LIMITED

The invention relates to a process for preparing composite particles, the process comprising contacting the plurality of particles in the reaction zone with a gas comprising at least 25 vol % of a silicon-containing precursor at a temperature effective to cause deposition of silicon in the pores of the porous particles. A controlled temperature differential between the maximum temperature of the internal surfaces of the reaction zone and the simultaneous minimum temperature within the plurality of porous particles is maintained during the contacting step.

Silicon-containing composite particles, the process comprising the steps of: (a) providing a plurality of porous particles comprising micropores and/or mesopores, wherein the D 50 particle diameter of the porous particles from 0.5 to 200 μm; the total pore volume of micropores and mesopores is from 0.4 to 2.2 cm 3 /g; and the PD 50 pore diameter is no more than 30 nm; c (b) combining a charge of the porous particles with a charge of a silicon-containing precursor in a batch pressure reactor, wherein the charge of porous particles has a volume of at least 20 cm 3 per litre of reactor volume (cm 3 /L RV ), and wherein the charge of the silicon-containing precursor comprises at least 2 g of silicon per litre of reactor volume (g/L RV ); and (c) heating the reactor to a temperature effective to cause deposition of silicon in the pores of the porous particles, thereby providing the silicon-containing composite particles.

The invention relates to a process for preparing composite particles, the process comprising contacting the plurality of particles in the reaction zone with a gas comprising at least 25 vol % of a silicon-containing precursor at a temperature effective to cause deposition of silicon in the pores of the porous particles. A controlled temperature differential between the maximum temperature of the internal surfaces of the reaction zone and the simultaneous minimum temperature within the plurality of porous particles is maintained during the contacting step.

Silicon-containing composite particles, the process comprising the steps of: (a) providing a plurality of porous particles comprising micropores and/or mesopores, wherein the D 50 particle diameter of the porous particles from 0.5 to 200 μm; the total pore volume of micropores and mesopores is from 0.4 to 2.2 cm 3 /g; and the PD 50 pore diameter is no more than 30 nm; c (b) combining a charge of the porous particles with a charge of a silicon-containing precursor in a batch pressure reactor, wherein the charge of porous particles has a volume of at least 20 cm 3 per litre of reactor volume (cm 3 /L RV ), and wherein the charge of the silicon-containing precursor comprises at least 2 g of silicon per litre of reactor volume (g/L RV ); and (c) heating the reactor to a temperature effective to cause deposition of silicon in the pores of the porous particles, thereby providing the silicon-containing composite particles.

The invention relates to a process for preparing composite particles, the process comprising contacting the plurality of particles in the reaction zone with a gas comprising at least 25 vol % of a silicon-containing precursor at a temperature effective to cause deposition of silicon in the pores of the porous particles. A controlled temperature differential between the maximum temperature of the internal surfaces of the reaction zone and the simultaneous minimum temperature within the plurality of porous particles is maintained during the contacting step.

The invention relates to a process for preparing composite particles, the process comprising contacting the plurality of particles in the reaction zone with a gas comprising at least 25 vol % of a silicon-containing precursor at a temperature effective to cause deposition of silicon in the pores of the porous particles. A controlled temperature differential between the maximum temperature of the internal surfaces of the reaction zone and the simultaneous minimum temperature within the plurality of porous particles is maintained during the contacting step.

Silicon-containing composite particles, the process comprising the steps of: (a) providing a plurality of porous particles comprising micropores and/or mesopores, wherein the D 50 particle diameter of the porous particles from 0.5 to 200 μm; the total pore volume of micropores and mesopores is from 0.4 to 2.2 cm 3 /g; and the PD 50 pore diameter is no more than 30 nm; c (b) combining a charge of the porous particles with a charge of a silicon-containing precursor in a batch pressure reactor, wherein the charge of porous particles has a volume of at least 20 cm 3 per litre of reactor volume (cm 3 /L RV ), and wherein the charge of the silicon-containing precursor comprises at least 2 g of silicon per litre of reactor volume (g/L RV ); and (c) heating the reactor to a temperature effective to cause deposition of silicon in the pores of the porous particles, thereby providing the silicon-containing composite particles.