Company patents
NOMURA MICRO SCIENCE CO., LTD.
NOMURA MICRO SCIENCE CO., LTD. exhibits a highly concentrated patent strategy, with an overwhelming 87.0% of its portfolio in Water / Sewage Treatment, which has maintained a steady patenting rate of 4 patents in 2025 and so far in 2026. Surprisingly, despite its core focus, the company also shows a notable presence in Separation Processes (Filtration, Distillation), comprising 34.8% of its portfolio, which experienced significant growth of +100.0% in 2024 and +50.0% in 2025, indicating an emerging focus on advanced separation technologies, even as patenting in Photolithography has seen a resurgence with 1 patent so far in 2026 after a two-year hiatus.
Patent Trend by Technology Area
Yearly patent publications since 2023
Product themes
Product-level themes inferred from filings since 2023, with category chips showing where each theme appears. Select a theme to filter the patents below.
23 US filings (since 2023) · 7 categories · 11 themes
Systems and methods specifically engineered for removing pollutants and impurities from water sources, ranging from groundwater decontamination to point-of-use filtration, often employing adsorption, membrane, or distillation techniques.
Membrane-based separation for water purification, contaminant removal, desalination, and wastewater treatment, including reverse osmosis, ultrafiltration, and forward osmosis modules.
Non-chemical or non-biological methods that alter the physical properties or structure of water, often claimed to improve its quality or interaction with biological systems, such as vortexing or electromagnetic treatment.
Processes that use strong oxidants, electrochemical methods, sonic waves, or other energy-intensive techniques to break down organic pollutants, disinfect water, or facilitate contaminant separation.
Membrane and depth filtration for industrial separation, gas purification, and bioprocess clarification including cross-flow, dead-end, tangential flow filtration, and oil/water separation.
Systems and methods that use sensors, data analysis, and automation to monitor water quality, process parameters, or system performance, enabling adaptive control, predictive maintenance, or incentive-based management.
Development of novel chemical compositions for photoresists, including polymers, sensitizers, and crosslinking agents, to achieve improved lithographic performance such as resolution, sensitivity, line edge roughness, and etch resistance.
Methods and equipment for applying photoresist uniformly onto wafers, forming patterns through various exposure techniques (e.g., direct imaging, multi-exposure), and integrating patterned layers into semiconductor structures or packaging.
Specific techniques and materials developed to remove persistent or difficult-to-treat pollutants from water, such as per- and polyfluoroalkyl substances (PFAS), micropollutants, or specific industrial chemicals.
Methods and compositions for identifying, quantifying, or characterizing specific biological molecules (e.g., nucleic acids, proteins, metabolites, antibodies) or microbial species, often for diagnostic, prognostic, or quality control applications.
Specialized cleaning techniques and apparatus designed for removing microscopic contaminants, residues, or films from sensitive substrates, such as semiconductor wafers or flat panel displays, often involving chemical, mechanical, or plasma-based methods.
Patents
Showing 1-10 of 27