Showa Denko K.K.

A material design device derives the optimal solution for a design condition satisfying a desired material property. A design condition setting unit for setting a specified range of a design condition of a material to be designed. A comprehensive prediction point generation unit generates a plurality of comprehensive prediction points within the specified range set by the design condition setting unit. A design condition-material property table stores data sets in which each point of the comprehensive prediction points is associated with a material property value calculated by inputting the comprehensive prediction points generated by the comprehensive prediction point generation unit, to a learned model. A required property setting unit sets a specified range of a required property of the material. A design condition extraction unit extracts, from the design condition-material property table, a data set satisfying the required property set by the required property setting unit.

An aluminum alloy member forms a fluoride film thereon, which does not form a black dot-shaped bulged portion and, therefore, has excellent smoothness and excellent corrosion resistance against a corrosive gas, plasma, and others. An aluminum alloy member for forming a fluoride film thereon, consists of: Si: 0.01 mass % to 0.3 mass %; Mg: 0.5 mass % to 5.0 mass %; Fe: 0.05 mass % to 0.5 mass %; Cu: 0.5 mass % or less; Mn: 0.30 mass % or less; Cr: 0.30 mass % or less, and the balance being Al and inevitable impurities, wherein when an average major diameter of Fe-based crystallized products in the aluminum alloy member is “D” (μm), and an average crystalline particle diameter in the aluminum alloy member is “Y” (μm), a relational expression: Log 10 Y<−0.320D+4.60 . . . (1) is satisfied. A fluoride film is formed on at least a part of a surface of the aluminum alloy.

Provided is an aluminum alloy member for forming a fluoride film thereon, the fluoride film being excellent in smoothness without occurrence of a black dot-shaped bulged portion and excellent in corrosion resistance against corrosive gas and plasma, etc. The aluminum alloy member for forming a fluoride film thereon 1 for use in a semiconductor producing apparatus consists of Si: 0.3 mass % to 0.8 mass %; Mg: 0.5 mass % to 5.0 mass %; Fe: 0.05 mass % to 0.5 mass %; Cu: 0 mass % or more and 0.5 mass % or less; Mn: 0 mass % or more and 0.30 mass % or less; Cr: 0 mass % or more and 0.30 mass % or less 0.5 mass % or less; and the balance being Al and inevitable impurities. When an average major diameter of a Fe-based crystallized product in the aluminum alloy member is D (μm), and an average crystalline particle diameter in the aluminum alloy member is Y (μm), a relation expression of log 10 Y←0.320D+4.60 is satisfied. A fluoride film 2 is formed on at least a part of a surface of the aluminum alloy member 1 for forming a fluoride film thereon.

Prediction accuracy is increased in a prediction device using a trained model. A prediction device includes: a first trained model and a second trained model configured to respectively output first output data and second output data in response to input of input data of a prediction target; and an output portion configured to obtain the first output data and the second output data and calculate a weighted average value or take a weighted majority, thereby outputting prediction data. The first trained model is configured such that prediction accuracy for the input data of an interpolation region becomes higher than in the second trained model. The second trained model is configured such that prediction accuracy for the input data of an extrapolation region becomes higher than in the first trained model.

Provided are an Al—Mg—Si based aluminum alloy forging excellent in mechanical properties in room temperature and hardly causing recrystallized grains and a production method thereof. An aluminum alloy forging consists of: Cu: 0.15 mass % to 1.0 mass %, Mg: 0.6 mass % to 1.15 mass %; Si: 0.95 mass % to 1.25 mass %; Mn: 0.4 mass % to 0.6 mass %; Fe: 0.2 mass % to 0.3 mass %; Cr: 0.11 mass % to 0.25 mass %; Ti: 0.012 mass % to 0.035 mass %; B: 0.0001 mass % to 0.03 mass %; Zn: 0.25 mass % or less; Zr: 0.05 mass % or less; and the balance being aluminum and inevitable impurities. The number of intermetallic compounds of Mg 2 Si with a minor axis of 0.5 μm or more present in a visual field area of 1.5815 mm 2 is 100 or less when a sectional structure of the aluminum alloy forging is observed at a magnification of 1,000 times.

An information processing system includes an annealing computing device, and a search device that converts a combinatorial optimization problem of a material composition asymptotically approaching a target physical property value into an Ising model and causes the computing device to solve the combinatorial optimization problem. The system receives a target value and a tolerable variation range of a physical property, converts a mathematical expression that formulates a combinatorial optimization problem of a material composition that asymptotically approaches the target value from a mixed material of materials having known physical property values, into the Ising model in a data format usable by the computing device, computes an optimum solution of the material composition asymptotically approaching the target value, using the Ising model, and excludes the materials included in the mixed material, from the material composition of the optimum solution computed, within the tolerable variation range, and outputs the material composition.

An aluminum alloy forging of the present invention includes 0.15 wt % to 1.0 wt % of Cu, 0.6 wt % to 1.3 wt % of Mg, 0.60 w t% to 1.45 wt % of Si, 0.03 wt % to 1.0 wt % of Mn, 0.2 wt % to 0.4 wt % of Fe, 0.03 wt % to 0.4 wt % of Cr, 0.012 wt % to 0.035 wt % of Ti, 0.0001 wt % to 0.03 wt % of B, 0.25 wt % or less of Zn, 0.05 wt % or less of Zr, the balance being Al and inevitable impurities. When integrated intensity of a diffraction peak of an AlFeMnSi phase in an X-ray diffraction pattern obtained by an X-ray diffraction measurement of a cross-section of the forging is “Q 1 ” (cpd·deg) and integrated intensity of a diffraction peak of a (200) plane of an Al phase is “Q 2 ” (cps·deg), a value of Q 1 /Q 2 is 6×10 −2 or less.

Model setting step sets a trained model acquired by machine learning of a correspondence relationship between an explanatory variable including information related to a material composition or a manufacturing condition of a target material, and an objective variable including information related to the material characteristics of the target material, and prediction step inputs an explanatory variable related to a target material whose material characteristics is to be predicted to the trained model set in the model setting step, and outputs an objective variable related to information of the explanatory variable, so as to predict the material characteristics of the target material to be predicted based on the objective variable. The explanatory variable includes a material characteristics evaluation temperature that is a temperature at a time of measurement of the material characteristics included in the objective variable, and an evaluation temperature holding time that is a time during which the material characteristics evaluation temperature is held until the measurement of the material characteristics.

Provided are an Al—Mg—Si based aluminum alloy forging excellent in mechanical properties in room temperature and hardly causing recrystallized grains and a production method thereof. An aluminum alloy forging consists of: Cu: 0.15 mass % to 1.0 mass %, Mg: 0.6 mass % to 1.15 mass %; Si: 0.95 mass % to 1.25 mass %; Mn: 0.4 mass % to 0.6 mass %; Fe: 0.2 mass % to 0.3 mass %; Cr: 0.11 mass % to 0.25 mass %; Ti: 0.012 mass % to 0.035 mass %; B: 0.0001 mass % to 0.03 mass %; Zn: 0.25 mass % or less; Zr: 0.05 mass % or less; and the balance being aluminum and inevitable impurities. The number of intermetallic compounds of Mg 2 Si with a minor axis of 0.5 μm or more present in a visual field area of 1.5815 mm 2 is 100 or less when a sectional structure of the aluminum alloy forging is observed at a magnification of 1,000 times.

A semiconductor wafer evaluation apparatus brings a contact maker (mercury liquefied at room temperature), as a Schottky electrode, into contact with a semiconductor wafer, intermittently applies a voltage from a pulse power supply, and evaluates the state (kinds, density) of point defects by an evaluation means based on the status of the electrostatic capacity of the semiconductor wafer. In this manner, the state (kinds, density) of the point defects in the plane of a large-diameter semiconductor wafer is directly evaluated using a large table.