Company patents
Siemens Industry Software Inc.
Siemens Industry Software Inc. maintains a strong focus on Electronic Design Automation (CAD/EDA), representing 48.2% of its portfolio, despite a notable decline of 38.6% in 2025 and a further 37.0% so far in 2026. Surprisingly, while Image Processing saw significant growth of 50.0% in 2024 and 33.3% in 2025, its patenting in Machine Learning & AI has almost ceased, with a 100.0% decline so far in 2026, indicating a potential shift away from direct AI innovation despite its relevance to their core software offerings.
Patent Trend by Technology Area
Yearly patent publications since 2023
Product themes
Product-level themes inferred from filings since 2023, with category chips showing where each theme appears. Select a theme to filter the patents below.
249 US filings (since 2023) · 12 categories · 23 themes
Automated methods and tools for generating, optimizing, and verifying the physical layout and interconnections of electronic components, including integrated circuits, printed circuit boards, and system-level interface protection.
Computational methods and design principles for generating optimized geometries, internal structures (e.g., lattices, minimal surfaces), or functional features that are specifically enabled or enhanced by the capabilities of additive manufacturing.
Using computational design and simulation to optimize the performance characteristics of specific components or materials within a larger engineering system.
Methods and circuits for detecting and mitigating defects, ensuring data integrity, and enabling self-testing and repair mechanisms within memory devices and subsystems.
Computational methods for modeling and simulating photolithography processes, including mask design, aerial image generation, and defect prediction for semiconductor manufacturing.
Systems and methods for real-time sensing, modeling, and closed-loop control of additive manufacturing parameters to ensure part quality, consistency, and process efficiency. This includes thermal management, atmospheric regulation, and precise material deposition.
Techniques and apparatus for electrically testing semiconductor devices, integrated circuits, or wafers during manufacturing or post-assembly, including built-in self-test (BIST) and contact reliability assessment.
Hardware and control techniques for optimizing memory access latency, ensuring data integrity, and managing storage resources efficiently. This includes error correction, read/write voltage control, and intelligent data placement or in-memory computation.
Processes for creating or manipulating three-dimensional digital representations of objects or environments, including mesh generation, surface fitting, and depth estimation from multiple views.
Techniques and hardware architectures for optimizing the radio frequency (RF) front-end, antenna systems, and beamforming strategies in wireless networks to improve signal quality, capacity, and interference mitigation.
Creating virtual models (digital twins) of complex physical systems to simulate their behavior, predict performance, validate designs, or guide operations under various conditions.
Techniques for building three-dimensional metal objects layer-by-layer using metal powders, including powder bed fusion, binder jetting, and directed energy deposition. This theme encompasses process mechanics, equipment design, and operational control for AM systems.
Innovations in the design, materials, and manufacturing of lithography masks, including reflective masks, programmable masks, and defect mitigation strategies, to enable finer feature patterning and process control.
Systems that process data to provide personalized recommendations, predict events, or automate decision-making processes based on learned patterns, user behavior, or environmental factors.
Creating virtual representations (digital twins) of physical industrial assets or processes for simulation and analysis, often combined with blockchain technology for secure data traceability and distributed control.
Techniques and apparatus for measuring critical dimensions, overlay accuracy, defect detection, and surface topography in lithographic processes, often involving optical, laser, or charged particle beams.
Techniques and hardware architectures designed to efficiently generate and display complex 3D graphics, particularly for interactive applications like virtual reality, focusing on speed and visual quality.
Utilizing machine learning, particularly deep learning, to analyze medical data such as images, sensor readings, or physiological signals for disease prediction, diagnosis, or treatment assessment.
Automated systems using image processing and artificial intelligence to identify, classify, and assess the extent of damage to structures or objects, supporting maintenance or insurance claims.
Methods and equipment for applying photoresist uniformly onto wafers, forming patterns through various exposure techniques (e.g., direct imaging, multi-exposure), and integrating patterned layers into semiconductor structures or packaging.
Methods and systems for integrating, transforming, and managing complex or domain-specific data from disparate sources into a unified structure, often for specific applications like social networks, genomics, or business forms.
Integration of additive manufacturing with subtractive manufacturing (e.g., machining, cutting) or other traditional processes within a single system or workflow to create parts with improved features, surface finish, or material properties, or to enable new manufacturing paradigms.
Focuses on the physical design, materials, and manufacturing processes for individual memory cells, including transistor structures, interconnects, and multi-layered (3D) architectures to enhance density and performance.
Patents
Showing 1-5 of 5
Substrate Patterning & Processing