EPISTAR CORPORATION

A semiconductor device is provided. The semiconductor device includes a first semiconductor structure, a second semiconductor structure on the first semiconductor structure and an active structure between the first semiconductor structure and the second semiconductor structure. The first semiconductor structure includes a first waveguiding layer having a first band gap, and a first interlayer directly contacting the first waveguiding layer and having a first thickness and a second bandgap lager than the first band gap. The first thickness is 5 nm-35 nm.

A light-emitting device is provided. An active layer is disposed on a substrate and between the first semiconductor layer and the second semiconductor layer. The first aluminum-containing semiconductor layer is disposed between the substrate and the first semiconductor layer, and a first aluminum composition ratio of the first aluminum-containing semiconductor layer is greater than that of the first semiconductor layer. The second aluminum-containing semiconductor layer is disposed between the first aluminum-containing semiconductor layer and the first semiconductor layer, and a second aluminum composition ratio of the second aluminum-containing semiconductor layer is greater than that of the first semiconductor layer. The stack structure is disposed between the first and second aluminum-containing semiconductor layers, and the stack structure includes first, second, and third indium-containing semiconductor layers stacked in sequence. The first, second, and third indium-containing semiconductor layers are made of In a1 Al b1 Ga 1-a1-b1 N (0<a1+b1<1), In a2 Al b2 Ga 1-a2-b2 N (0<a2+b2<1, and In a3 Al b3 Ga 1-a3-b3 N (0<a3+b3<1), respectively, and 0<a3≤a1<a2.

An embodiment of the present disclosure provides a semiconductor device. The semiconductor device has a first semiconductor structure; a second semiconductor structure on the first semiconductor structure and having a first aluminum content; a plurality of voids in the second semiconductor structure; an active structure between the first semiconductor structure and the second semiconductor structure; and a third semiconductor structure between the active structure and the second semiconductor structure, and having a second aluminum content. The first aluminum content is greater than the second aluminum content.

A semiconductor device includes a substrate, an epitaxial structure and a first interlayer. The substrate has an upper surface and a bottom surface. The epitaxial structure is on the upper surface and includes an active structure. The first interlayer is on the bottom surface and includes M1x1Ny1. M1 is metal and N is nitrogen, and x1>y1.

A semiconductor device is provided. The semiconductor device includes a substrate and a stack structure. The substrate includes a first upper region, a second upper region, a third upper region and a fourth upper region. The stack structure locates on the fourth upper region of the substrate without overlapping the first upper region, the second upper region and the third upper region. The stack structure includes a first end face, a top surface, a first semiconductor layer, an active region, and a second semiconductor layer. The second semiconductor layer includes a ridge structure. The first upper region is closer to the light emitting end face than the second upper region is. The semiconductor device has a first depth between the top surface and the first upper region, and a second depth between the top surface and the second upper region smaller than the first depth.

A package includes a substrate, a first light-emitting unit, a second light-emitting unit, a light-transmitting layer, and a light-absorbing layer. The substrate has a first surface and an upper conductive layer on the first surface. The first light-emitting unit and the second light-emitting unit are disposed on the upper conductive layer. The first light-emitting unit has a first light-emitting surface and a first side wall. The second light-emitting unit has a second light-emitting surface and a second side wall. The light-transmitting layer is disposed on the first surface and covers the upper conductive layer, the first light-emitting unit, and the second light-emitting unit. The light-absorbing layer is disposed between the substrate and the light-transmitting layer, covers the upper conductive layer, the first side wall, and the second side wall, and exposes the first light-emitting surface and the second light-emitting surface.

A light-emitting device is provided. An active layer is disposed on a substrate and between the first semiconductor layer and the second semiconductor layer. The first aluminum-containing semiconductor layer is disposed between the substrate and the first semiconductor layer, and a first aluminum composition ratio of the first aluminum-containing semiconductor layer is greater than that of the first semiconductor layer. The second aluminum-containing semiconductor layer is disposed between the first aluminum-containing semiconductor layer and the first semiconductor layer, and a second aluminum composition ratio of the second aluminum-containing semiconductor layer is greater than that of the first semiconductor layer. The stack structure is disposed between the first and second aluminum-containing semiconductor layers, and the stack structure includes first, second, and third indium-containing semiconductor layers stacked in sequence. The first, second, and third indium-containing semiconductor layers are made of In a1 Al b1 Ga 1-a1-b1 N (0<a1+b1<1), In a2 Al b2 Ga 1-a2-b2 N (0<a2+b2<1, and In a3 Al b3 Ga 1-a3-b3 N (0<a3+b3<1), respectively, and 0<a3≤a1<a2.

A semiconductor device includes a substrate, a first type semiconductor structure, semiconductor columnar bodies between the substrate and the first type semiconductor structure, a first electrode and a second electrode. The first type semiconductor structure includes a first surface, a second surface opposite the first surface and away from the substrate, a first extension and a second extension respectively extending outward beyond the semiconductor columnar bodies. The first electrode and the second electrode are on the second surface of the first type semiconductor structure.

A semiconductor device includes a substrate, an epitaxial stack disposed on the substrate, a first connection layer between the epitaxial stack and the substrate and a first electrode disposed on the first connection layer. The substrate has a first side surface and a second side surface. The epitaxial stack has a semiconductor structure with a first lateral surface adjacent to the first side surface and a second lateral surface opposing the first lateral surface and adjacent to the second side surface. The first connection layer has a first protruding portion extending beyond the first lateral surface and a second protruding portion extending beyond the second lateral surface. The first electrode is in contact with the first protruding portion and the second protruding portion.

A package includes a substrate, a first light-emitting unit, a second light-emitting unit, a light-transmitting layer, and a light-absorbing layer. The substrate has a first surface and an upper conductive layer on the first surface. The first light-emitting unit and the second light-emitting unit are disposed on the upper conductive layer. The first light-emitting unit has a first light-emitting surface and a first side wall. The second light-emitting unit has a second light-emitting surface and a second side wall. The light-transmitting layer is disposed on the first surface and covers the upper conductive layer, the first light-emitting unit, and the second light-emitting unit. The light-absorbing layer is disposed between the substrate and the light-transmitting layer, covers the upper conductive layer, the first side wall, and the second side wall, and exposes the first light-emitting surface and the second light-emitting surface.