HITACHI HIGH-TECH SCIENCE CORPORATION

This charged particle beam device, which is for etching a sample, comprises: a charged particle beam-emitting optical system that emits a charged particle beam; a sample stage that holds a sample; a drive mechanism that drives the sample stage; a gas supply unit that supplies etching gas to the surface of the sample; and a computer that sets a processing region of the sample and controls the charged particle beam-emitting optical system and the drive mechanism so as to irradiate the set processing region with the charged particle beam and etch the sample. The computer sets a processing region on the sample that differs for each scan. The computer sets a different processing region for each scan on the sample.

This charged particle beam device, which is for processing a sample, comprises: a charged particle beam-emitting optical system that emits a charged particle beam; a sample stage that holds a sample; a drive mechanism that drives the sample stage; and a computer that sets a cross-section of the sample in a processing region of the sample and controls the charged particle beam-emitting optical system and the drive mechanism when slicing the set processing region. The computer sets an irradiation location in a position where each of a plurality of emitted charged particle beams overlap one another in a first direction of the sample processing region when slicing the processing region.

A focused ion beam lens column ( 17 ) of this charged particle beam device includes an ion source ( 41 ) and an ion optics ( 42 ). The ion optics ( 42 ) includes a diaphragm member ( 54 b ) provided with a plurality of through-holes that are switched in order to cause a portion of a beam of the ions (an ion beam) generated by the ion source ( 41 ) to pass therethrough. Switching is performed to select any of the plurality of through-holes while the optical conditions of the ion optics ( 42 ) are maintained in a predetermined projection mode (second projection mode). The plurality of through-holes includes fine round holes for observation that are positioned in the center of the ion beam, first rectangular holes for processing that are positioned off the center of the ion beam, and second rectangular holes for observation and processing that are positioned off the center of the ion beam.

A sample container and a thermal analyzer that enable stable observation of measurement samples in thermal analysis are proposed. The sample container is a sample container used with a thermal analyzer for measurement of thermal behavior according to a temperature variation from heating or cooling of a measurement sample and observes the measurement sample. The sample container includes a body in a cylindrical shape having a bottom and an open top, a transparent or translucent pressure plate accommodated in the body to press the measurement sample placed on a bottom surface of the body from a top, and a lid accommodated in the body, placed on top of the pressure plate, and having a hole for observing the measurement sample.

A sample container and a thermal analyzer that enable stable observation of measurement samples regardless of the surface state of the sample container in thermal analysis are proposed. The sample container is a sample container used with a thermal analyzer for measurement of thermal behavior according to a temperature variation from heating or cooling of a measurement sample and observation of the measurement sample. The sample container includes a body in a cylindrical shape having a bottom and an open top and a loading plate placed on a bottom surface inside the body on which the measurement sample is to be placed, wherein average roughness of a surface of the loading plate that faces the measurement sample is less than average roughness of the bottom surface.

Disclosed is an apparatus for acquiring polarized images attached to a thermal analysis apparatus including a pair of sample containers housing a measurement sample and a reference sample, respectively, and a heating furnace, configured to observe at least the measurement sample through a window or an opening of the heating furnace, and including an attachment section attached to the thermal analysis apparatus, a light source, a polarizer configured to polarize light emitted from the light source, a camera and an analyzer polarize light reflected from the measurement sample or the reference sample to enter the camera after the measurement sample or the reference sample is irradiated via the window or the opening with polarized light transmitted through the polarizer. A first optical path of the polarizer and a second optical path of the analyzer are not parallel, and both the polarizer and the analyzer are rotatable.

This machining method includes: a machining step of irradiating a sample constituted from a stack of multiple layers with a focused ion beam so as to machine a cross-section of the sample by a predetermined amount; an image generation step of generating an observation image of the cross-section of the sample by irradiating the sample with an electron beam after the machining step is ended; and a specific-layer determination step of determining whether a specific layer of the multiple layers is exposed based on the observation image.

This charged particle beam device ( 10 ) comprises a focused ion beam irradiation optical system ( 14 ), an electron beam irradiation optics ( 15 ), a needle ( 18 ), a needle drive mechanism ( 19 ), a display device ( 21 ), and a computer ( 22 ). The computer ( 22 ) stores coordinate data for the needle drive mechanism ( 19 ) when the tip of the needle ( 18 ) matches a prescribed position in an image obtained by irradiating the needle ( 18 ) with a focused ion beam or an electron beam. The computer ( 22 ) controls the needle drive mechanism ( 19 ) and the focused ion beam irradiation optics ( 14 ) such that when the total amount of change in the coordinate data in a suitable period is at least a prescribed threshold, a process is executed for removing, by means of irradiation with the focused ion beam, at least a portion of a deposition film attached to the tip of the needle ( 18 ).

Proposed is an X-ray analysis apparatus capable of detecting a foreign matter and identifying elements in the foreign matter with high accuracy even when applied to a roll-to-roll method, without reducing throughput. The X-ray analysis apparatus includes an unwinding part continuously unwinding therefrom a sample, a foreign matter inspection and analysis part inspecting and analyzing a foreign matter in the sample, and a winding part winding thereon the sample. The foreign matter inspection and analysis part includes a foreign matter location detection part detecting a location of the foreign matter in the sample, an intermittent transfer part intermittently stopping movement of a portion of the sample where the foreign matter is detected when the foreign matter is detected or slowly moving the portion, and an X-ray analysis part analyzing the portion while the portion is stopped or moved slowly by irradiating the portion with X-rays.

Disclosed is a chromatographic data processing device to easily obtain peak characteristic points in a short period of time with less susceptibility to noise. The chromatographic data processing device includes a partial regression curve calculation unit configured to obtain a partial regression curve for each of a plurality of data groups in which a predetermined number of measured time-series data are combined, a partial characteristic point acquisition unit configured to obtain a partial characteristic point for each of the obtained partial regression curves, and a peak characteristic point acquisition unit configured to obtain a peak characteristic point in the measured time-series data pieces on the basis of the partial characteristic points.