Company patents
HITACHI HIGH-TECH SCIENCE CORPORATION
HITACHI HIGH-TECH SCIENCE CORPORATION's patent strategy appears to be undergoing a significant shift, with its dominant Material & Chemical Analysis category, representing 66.7% of its portfolio, experiencing a sharp decline of -57.1% in 2025 and no patents so far in 2026. This suggests a potential reallocation of resources, despite Electron / Ion Tubes & Discharge maintaining a steady patent output in 2025, indicating a possible refocus within its semiconductor-related innovations.
Patent Trend by Technology Area
Yearly patent publications since 2023
Product themes
Product-level themes inferred from filings since 2023, with category chips showing where each theme appears. Select a theme to filter the patents below.
54 US filings (since 2023) · 4 categories · 7 themes
Methods and apparatus for precise wafer positioning, ion beam uniformity, and dose monitoring during ion implantation processes in semiconductor device manufacturing.
Techniques and devices for generating, shaping, focusing, and deflecting electron or ion beams, often involving multi-pole lenses, deflectors, and aberration correction for applications like microscopy or processing.
Techniques and apparatus utilizing various spectroscopy methods (e.g., Raman, NIRS, photometric, interferometric) for identifying substances, measuring concentrations, or monitoring chemical and physical processes in industrial, environmental, or laboratory settings.
Methods and compositions for identifying, quantifying, or characterizing specific biological molecules (e.g., nucleic acids, proteins, metabolites, antibodies) or microbial species, often for diagnostic, prognostic, or quality control applications.
Systems and methods for acquiring and analyzing image data across multiple discrete spectral bands or a continuous spectrum, often for material characterization, environmental monitoring, or remote sensing applications.
Systems and methods for delivering radio frequency (RF) power to plasma processing chambers, including impedance matching, pulse shaping, and feedback control for stable and efficient plasma generation.
Use of thermal and infrared sensors for non-contact temperature measurement, occupancy detection, structural health monitoring, fire/hazard detection, and process control in diverse industrial, environmental, and security applications.
Patents
Showing 1-10 of 13
Spectroscopic Material & Process Analysis