Company patents

HyperLight Corporation

HyperLight Corporation's patent strategy is heavily concentrated in Liquid Crystal & Optical Modulators, representing 82.2% of its portfolio, which saw a significant surge in 2025 with a 145.5% YoY growth before a partial decline of 48.1% so far in 2026. Surprisingly, despite this core focus, the company is also rapidly expanding its Optical Elements & Systems portfolio, which grew by 250.0% in 2024 and 71.4% in 2025, indicating an emerging focus beyond its primary display-related innovations.

Patent Trend by Technology Area

Yearly patent publications since 2023

Product themes

Product-level themes inferred from filings since 2023, with category chips showing where each theme appears. Select a theme to filter the patents below.

73 US filings (since 2023) · 3 categories · 5 themes

Photonic Integration & Interconnects

The design and manufacturing of integrated circuits that combine optical and electronic components, particularly for high-speed data communication between processors and memory.

Liquid Crystal & Optical ModulatorsOptical Elements & Systems
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19since 2023
+20.0%YoY
Metasurface & Diffractive Optics

Engineering of artificial subwavelength structures (meta-atoms) to create metasurfaces that manipulate light properties (phase, polarization, wavelength) for multi-functional optical devices.

Liquid Crystal & Optical Modulators
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15since 2023
+800.0%YoY
Advanced Display Backlight & Optics

Innovations in backlight units, optical films, and light management structures to enhance display performance, uniformity, viewing experience, or specific functionalities like touch.

Liquid Crystal & Optical Modulators
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14since 2023
+200.0%YoY
Electrophoretic Display Control

Techniques for driving electrophoretic displays, including managing remnant voltage, optimizing particle movement, and specific addressing pulse schemes to improve optical quality and update speed.

Liquid Crystal & Optical Modulators
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10since 2023
+400.0%YoY
Lithography Metrology & Inspection

Techniques and apparatus for measuring critical dimensions, overlay accuracy, defect detection, and surface topography in lithographic processes, often involving optical, laser, or charged particle beams.

Photolithography
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3since 2023
0.0%YoY

Patents

Showing 21-30 of 89

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