MKS Instruments, Inc.

Devices and methods for mass flow verification are provided. A mass flow verifier includes a chamber configured to receive a fluid, a critical flow nozzle upstream of the chamber, a chamber valve, a downstream valve, and a bypass valve. The chamber valve is configured to selectively enable fluid flow from the critical flow nozzle to the chamber. The downstream valve is configured to selectively enable fluid flow from the chamber to a downstream location. The bypass valve is configured to selectively enable fluid flow from the critical flow nozzle to a dump location. The mass flow verifier further includes a controller configured to verify flow rate of the fluid based on a rate of rise in pressure of the fluid as detected by a pressure sensor in the chamber.

A plasma source is configured to be in fluid communication with the interior of a vacuum vessel, a vacuum chamber, such as by being installed in a wall of a vacuum vessel that encloses the chamber, or in a pipe that is connected to the chamber. The plasma source may produce plasma in a line of sight of a surface to be cleaned, such as an internal surface of the vessel, which may be used for processes such as deposition or etching.

A thermal conductivity gauge measures gas pressure within a chamber. A sensor wire and a resistor form a circuit coupled between a power input and ground, where the sensor wire extends into the chamber and connects to the resistor via a terminal. A controller adjusts the power input, as a function of a voltage at the terminal and a voltage at the power input, to bring the sensor wire to a target temperature. Based on the adjusted power input, the controller can determine a measure of the gas pressure within the chamber.

A radio frequency (RF) generator includes a power source configured to generate an RF signal applied to the load and a power controller coupled to the power source. The power controller is configured to generate a control signal to vary the RF signal, wherein the control signal adjusts a frequency of the RF signal in accordance with an external RF signal applied to the load. The frequency adjustment is variable in accordance with a cost responsive to a perturbation of the frequency of the RF signal.

A mass flow controller and methods of providing for mass flow control are provided. A mass flow controller includes a control valve configured to control flow of a fluid in a flow path. A first flow sensor detects a first set of fluid flow parameters, and a second flow sensor detects a second set of fluid flow parameters. The first and second flow sensors are of distinct flow measurement types. The mass flow controller further includes a controller configured to determine a set of first mass flow rates based on the first set of fluid flow parameters detected by the first flow sensor and calibrate the second flow sensor based on the determined set of mass flow rates of the first mass flow sensor and the second set of fluid flow parameters.

A plasma apparatus of a plasma processing system is provided. The plasma apparatus defines a toroidal plasma channel and includes multiple end blocks defining respective portions of the toroidal plasma channel. Each end block includes an end-block tube constructed from a first electrically conductive material and a dielectric coating disposed on an interior surface of the end-block tube. The plasma apparatus also includes multiple mid-blocks defining respective portions of the toroidal plasma channel. Each mid-block includes at least one heat sink located adjacent to a substantially linear tube with a thermal interface disposed therebetween. The thermal interface is in physical communication with the tube and the at least one heat sink. The mid-block tube has a substantially uniform wall thickness and is constructed from a dielectric material. The at least one heat sink is constructed from a second electrically conductive material.

A controller for a generator includes a feedforward control module. The feedforward control module is configured to generate an adjustment profile to control a parameter of a generator in accordance with a desired output signal. The feedforward control module generates a plurality of adjustment values in accordance with sub-regions of the output signal. Each sub-region includes a portion of the desired output signal.

A radio frequency (RF) power generation system includes a RF power source that generates a RF output signal delivered to a load. A RF power controller is configured to generate a control signal to vary the RF output signal. The controller adjusts a parameter associated with the RF output signal, and the parameter is controlled in accordance with a trigger signal. The parameter is adjusted in accordance with a cost function, and the cost function is determined by intruding a perturbation into an actuator that affects the cost function. The actuator may control an external RF output signal, and the trigger signal may vary in accordance with the external RF output signal.

A thermal conductivity gauge measures gas pressure within a chamber. A sensor wire and a resistor form a circuit coupled between a power input and ground, where the sensor wire extends into the chamber and connects to the resistor via a terminal. A controller adjusts the power input, as a function of a voltage at the terminal and a voltage at the power input, to bring the sensor wire to a target temperature. Based on the adjusted power input, the controller can determine a measure of the gas pressure within the chamber.

A plasma source, comprising a plasma source body, comprising: a plurality of magnetic cores, a plurality of primary windings capable of being energized, and a cooling structure, wherein one or more sections of the plasma source body comprising a dielectric material, and wherein, when the plurality of primary windings are energized, a plasma forms around an outer portion of the plasma source body.